Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

• Serguei Chiriaev,
• Luciana Tavares,
• Vadzim Adashkevich,
• Arkadiusz J. Goszczak and
• Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

• irradiation-induced mechanical strain in the patterning process are elaborated and discussed. Keywords: direct patterning; focused helium ion beam; out-of-plane nanopatterning; polymers; thin films; Introduction Micro- and nanofabrication with focused ion beams (FIBs) is currently a subject of strong

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• conditions and enabled the possibility of direct patterning/writing during the vapor deposition process [44]. A patterning mask made of colloidal crystals has also been demonstrated for the vapor deposition of polymers without requiring photolithographic processes or a stamp [45]. Although most of these

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• nanowire suspension was placed on Si/SiO2 substrates on which interdigitated Ti/Au electrodes were patterned by photolithography (Figure 4). FIBIM is a direct patterning method employed for the design of metallic nanostructures. The method is based on the interaction of an ion beam with the surface

High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

• Jorge Trasobares,
• François Vaurette,
• Marc François,
• Hans Romijn,
• Jean-Louis Codron,
• Dominique Vuillaume,
• Didier Théron and
• Nicolas Clément

Beilstein J. Nanotechnol. 2014, 5, 1918–1925, doi:10.3762/bjnano.5.202

• actual limitation of the proposed high-speed writing technique is the resist exposure time. Recently, direct patterning of high density sub-15 nm gold dot array using ultrahigh contrast electron beam lithography process on positive tone resist has been demonstrated [21]. Combination of high contrast

Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM

• Xiaoxing Ke,
• Carla Bittencourt,
• Sara Bals and
• Gustaaf Van Tendeloo

Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9

• ). Demonstrating the ability of FEBID to deposit nanoclusters on both sides of the CNTs, we believe that the application of FEBID as a direct patterning approach can be extended to various electron-transparent structures, such as nanowires, thin films and graphene. Furthermore, taking into account that